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ROUND LAB Sheet Mask

SKU 100004658

$18.53

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Product Information

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The ROUND LAB Pinus Mask is designed to soothe and calm tired and sensitive skin, featuring pine leaf extract, LHA for gentle exfoliation, and a double wave sheet that delivers a cooling effect and moisture through triple hyaluronic acid. It also incorporates a blend of five centella asiatica ingredients to smooth skin texture and enhance the mask's overall soothing properties.

Suitable For

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Exfoliating hydrating moisturizing soothing Fast-Absorbing Redness Sensitivity Redness Pores Dryness Sensitive Skin

Key Benefits

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Provides relief and soothes tired and sensitive skin through the use of pine leaf extract and LHA, enhancing hydration and exfoliation.
Features a double wave sheet that delivers a cooling effect and moisturizes with a smooth texture.
Contains a blend of five different centella asiatica ingredients for comprehensive skin care, targeting smoother skin texture and calming irritation.

Key Highlights

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Skin Concern:

Skin Type:

Sensitive Skin

Efficacy:

Key Ingredients

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Glycereth-261,2-HexanediolDisodium EDTAPolyglyceryl-4 CaprateHydrolyzed Hyaluronic AcidMadecassosideCarbomerChondrus CrispusHydroxyethylcelluloseAmmonium Polyacryloyldimethyl TaurateXanthan GumPolyglyceryl-6 CaprylateHyaluronic AcidSodium HyaluronatePinus Densiflora Leaf ExtractCentella Asiatica ExtractWater;AquaPortulaca Oleracea ExtractTromethamineAsiatic AcidGlycoproteinsButylene GlycolGlycerinBiosaccharide Gum-1Dipropylene GlycolPropanediolAsiaticosideHydroxyacetophenoneMadecassic AcidCapryloyl Salicylic AcidEthylhexylglycerin